This titanium dioxide (TiO2) sputtering target from Nanografi is a 99.9% purity source material for thin film deposition. Each piece measures 4'' in size with a thickness of 0.250'', and the target has a grey to black appearance.
Sputter deposition works by eroding material from the target and transferring it onto a substrate such as a silicon wafer. The technique can coat many substrate shapes and sizes, gives repeatable results, and scales from small research and development work up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight, or on the substrate. Although the number of variables makes sputtering a complex process, it also gives experienced users considerable control over film growth and microstructure.
- Deposition of TiO2 thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, for example in secondary ion mass spectrometry (SIMS) to determine composition and detect trace impurities.
- Research related to space weathering, where sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01TI66
- Material: Titanium Dioxide (TiO2)
- Size: 4''
- Thickness: 0.250''
- Color: Grey to Black
- Product code: NG0ST01TI66
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