Titanium dioxide (TiO2) sputtering targets are solid ceramic oxide sources used in physical vapor deposition (PVD) to produce thin films. During sputtering, energetic ions bombard the target surface, ejecting TiO2 material that condenses onto a substrate as a uniform film. TiO2 belongs to the metal oxide group and is valued for its optical and chemical stability.
- 1 piece
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- Optical coatings, such as anti-reflective and interference layers
- Photocatalytic and self-cleaning thin films
- Dielectric layers in electronic and semiconductor device research
- Protective and functional coatings for glass and other substrates
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