Titanium dioxide (TiO2) sputtering targets are solid, plate-shaped source materials used in physical vapor deposition (PVD) to produce thin films. Sputtering bombards the target with energetic ions, releasing atoms that deposit onto a substrate. TiO2 belongs to the metal oxide group, valued for its optical and semiconducting behavior. This product is a beige-to-white ceramic target supplied in a 3 inch size with 0.125 inch thickness and 99.99% purity.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Deposition of optical thin films such as anti-reflective and interference coatings
- Research on photocatalytic and self-cleaning TiO2 layers
- Dielectric and buffer layers in electronic and semiconductor device studies
- Fabrication of thin-film sensor and transparent conductive oxide development
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—
