Titanium nitride (TiN) is a ceramic compound of titanium and nitrogen, classified as a transition metal nitride. It is widely studied for its hardness, chemical stability, and gold-like appearance, and it is commonly used as a source material for physical vapor deposition (PVD) processes. This sputtering target is supplied for depositing TiN thin films in research and industrial coating development.
- 1 piece
For technical specifications, CoA, or quotation, including target bonding and backing details, please contact AMI Scientific.
- Hard protective coatings on cutting tools and wear-resistant components
- Decorative coatings with a metallic appearance
- Diffusion barrier layers in semiconductor and microelectronics research
- Electrode and contact thin films in device development
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