Titanium nitride (TiN) is a ceramic compound of titanium and nitrogen, belonging to the transition metal nitride group. It is widely studied for its hardness, chemical stability, and characteristic gold-like appearance. TiN sputtering targets are solid, dense disks used in physical vapor deposition (PVD) to deposit thin films of titanium nitride onto substrates for research and development.
- Quantity: 1 piece
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- Hard protective coatings on cutting tools and wear-resistant components
- Decorative coatings with a gold-like finish
- Diffusion barrier layers in microelectronics and semiconductor research
- Thin-film studies in materials science and surface engineering
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