Titanium nitride (TiN) sputtering targets are solid ceramic-based source materials made from titanium nitride, a refractory compound of titanium and nitrogen. They are used in physical vapor deposition (PVD) processes to deposit thin films of TiN onto substrates, forming a hard, wear-resistant, and gold-colored coating layer.
- Quantity: 1 piece
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- Hard protective coatings on cutting tools and wear-prone machine components
- Decorative coatings on metals, glass, and consumer surfaces
- Diffusion barrier layers in thin-film and semiconductor device research
- Thin-film studies for optical and functional coating development
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