Titanium Nitride (TiN) sputtering targets are solid source materials used in physical vapor deposition (PVD) to produce thin films of titanium nitride. TiN belongs to the group of transition metal nitride ceramics, known for their hardness, chemical stability, and characteristic gold-like color. During sputtering, energetic ions bombard the target surface and eject atoms that condense onto a substrate, forming a uniform coating for research and industrial use.
- Quantity: 1 piece
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- Hard protective coatings on cutting tools and wear-resistant components
- Diffusion barrier layers in thin-film and microelectronic device research
- Decorative and optical thin films on glass, metal, and polymer substrates
- Electrode and contact layer development in materials science studies
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