Tungsten disulfide (WS2) is a layered transition metal dichalcogenide, part of the two-dimensional material family in which strong in-plane bonds are separated by weak van der Waals gaps. WS2 sputtering targets are solid, consolidated sources used in physical vapor deposition (PVD) to deposit thin films of this material onto substrates. The nanomaterial class makes these targets relevant to research on layered semiconductors and functional surface coatings.
- Quantity: 1 piece
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- Deposition of thin-film WS2 layers for optoelectronic and semiconductor device research
- Development of solid lubricant and low-friction coatings
- Fabrication of catalytic and photocatalytic thin films
- Electrode and energy-storage film research
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