Tungsten disulfide (WS2) sputtering targets are solid, inorganic sources of tungsten disulfide, a layered transition metal dichalcogenide (TMD) with a structure similar to graphite. Nanomaterial-grade WS2 is widely studied for its semiconducting and tribological properties. These targets are designed for physical vapor deposition (PVD) processes, where the material is sputtered onto substrates to form thin films for research and development.
- Quantity: 1 piece
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- Deposition of thin films for two-dimensional material and semiconductor device research
- Solid lubricant coatings for low-friction surfaces in mechanical and tooling applications
- Optoelectronic and photodetector thin-film development
- Catalysis and energy-related coating studies
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