Tungsten oxide (WO3) sputtering targets are ceramic source materials used in physical vapor deposition to form thin films of tungsten oxide on substrates. Tungsten oxide belongs to the transition metal oxide group, known for its electrochromic, gas-sensing, and photocatalytic behavior. The target is supplied in a form compatible with standard sputtering systems, supporting controlled and reproducible film growth in research settings.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Electrochromic thin-film research for smart windows and displays
- Gas sensor layer development
- Photocatalytic coating studies
- Functional oxide thin-film deposition in materials science laboratories
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