Tungsten oxide (WO3) sputtering targets are dense, solid source materials used in physical vapor deposition (PVD) to deposit thin films onto substrates. Tungsten oxide belongs to the transition metal oxide group, known for its functional optical, electrical, and chemical properties. Sputtering targets provide a consistent material source for controlled film growth in laboratory and pilot-scale processes.
- Quantity: 1 piece
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- Electrochromic thin films for smart window research
- Gas sensing layers for metal oxide sensor development
- Photocatalytic and functional coating studies
- Thin-film device fabrication in academic and R&D laboratories
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