Tungsten oxide (WO3) sputtering targets are dense, solid ceramic sources of tungsten oxide used in physical vapor deposition (PVD). Tungsten oxide is an inorganic transition metal oxide known for its functional optical, electrical, and gas-sensing behavior. During sputtering, the target material is bombarded with ions so that it is deposited as a uniform thin film onto a substrate, making these targets suitable for laboratory and industrial thin-film processes.
- Quantity: 1 piece
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- Electrochromic thin films for smart windows and display research
- Gas sensing layers for metal oxide sensor development
- Photocatalytic and functional coatings studies
- Thin-film electronics and optical coating research
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