Tungsten oxide (WO3) sputtering targets are ceramic oxide source materials used in physical vapor deposition to form thin films. WO3 belongs to the transition metal oxide family and is widely studied for its functional optical, electrical, and gas-sensing properties. The target material is sputtered in a vacuum chamber to deposit a uniform oxide layer onto a substrate.
- Quantity: 1 piece
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- Electrochromic thin films for smart window and display research
- Gas-sensing layers for chemical and environmental sensor development
- Photocatalytic and functional coatings studies
- Optoelectronic and thin-film device prototyping in university and industrial laboratories
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