Tungsten oxide (WO3) sputtering targets are ceramic source materials used in physical vapor deposition (PVD) to produce tungsten oxide thin films. WO3 belongs to the transition metal oxide group, known for its functional optical, electrical, and gas-responsive properties. Sputtering targets provide a stable, consistent material source for depositing uniform films onto research substrates and device components.
- 1 piece
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- Electrochromic coatings for smart windows and display research
- Gas sensing layers for metal oxide sensor development
- Photocatalytic thin films for environmental and surface studies
- Optical and functional coatings in materials science research
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