Tungsten Titanium (TiW) sputtering targets are solid source materials used in physical vapor deposition (PVD) to form thin films. TiW is a tungsten-titanium alloy, a material class widely used in thin-film and coating research. Nanografi supplies this target through AMI Scientific for laboratory and industrial deposition work.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.
- Diffusion barrier layers in semiconductor and microelectronic metallization research
- Adhesion and barrier layer development for thin-film stacks
- Deposition process development in sputtering systems
- Academic studies of alloy thin films and their properties
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