TiW sputtering targets are solid metal alloy targets made from tungsten and titanium, designed for physical vapor deposition (PVD) processes such as magnetron sputtering. Tungsten-titanium is a refractory metal alloy, and the target serves as the source material that is sputtered onto a substrate to form a thin film. Nanografi supplies this material through AMI Scientific for research and development use.
- Quantity: 1 piece
For technical specifications, CoA, or a quotation, please contact AMI Scientific.
- Diffusion barrier layers in semiconductor and microelectronics research
- Adhesion and interconnect layers in thin-film device fabrication
- Protective and hard coating studies in materials research
- Thin-film process development in university and industrial laboratories
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