Tungsten (W) sputtering targets are solid source plates used in physical vapor deposition (PVD) to produce thin films on substrates. Tungsten is a refractory metal, a group known for high-temperature stability and mechanical robustness, which makes its targets suitable for demanding thin-film processes.
- Quantity: 1 piece
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- Thin-film deposition for microelectronics research, such as barrier and interconnect layers
- Hard and wear-resistant coating studies
- Optical and functional thin-film development
- Materials science research on refractory metal films
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