Tungsten (W) sputtering targets are solid plates or discs made from elemental tungsten, a refractory transition metal valued for its high-temperature stability and robustness. In physical vapor deposition (PVD), the target serves as the source material: energetic ions bombard its surface, ejecting tungsten atoms that condense onto a substrate to form a thin film. Tungsten targets belong to the metal sputtering target category and are widely used in thin-film research and process development.
- Quantity: 1 piece
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- Deposition of tungsten and tungsten-based thin films for microelectronics research
- Diffusion barrier and interconnect layer studies in semiconductor device fabrication
- Hard, wear-resistant coatings for cutting tools and mechanical components
- Optical and X-ray related thin-film coatings in materials research
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