Tungsten (W) sputtering targets are solid metal sources used in physical vapor deposition (PVD) to produce thin films. Tungsten is a refractory metal, valued for its mechanical stability and thermal resistance. Targets are typically supplied as plates or discs for use in magnetron sputtering systems.
- 1 piece
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- Thin-film deposition research for microelectronic interconnect and diffusion barrier layers
- Development of wear-resistant and hard protective coatings
- Coating studies for optical and electronic devices
- Materials research on refractory metal films for high-temperature environments
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