Tungsten (W) sputtering targets are solid metal sources used in physical vapor deposition (PVD), where ion bombardment ejects target atoms that deposit as a thin film onto a substrate. Tungsten is a refractory transition metal, valued for its hardness, thermal stability, and resistance to wear and high temperatures. Nanografi offers this material as a sputtering target for research and thin-film processing.
- 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Diffusion barrier and interconnect layers in microelectronics research
- Hard, wear-resistant protective coatings
- Thin-film resistor and electrode layers in electronic device development
- Coating studies for optical and high-temperature applications
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