Tungsten (W) sputtering targets are solid, high-density discs or plates made from tungsten metal. They serve as the source material in physical vapor deposition (PVD), where ions bombard the target surface and eject atoms that condense onto a substrate to form a thin film. Tungsten is a refractory metal, so these targets are commonly chosen for films that need high-temperature stability and mechanical robustness.
- Quantity: 1 piece
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- Diffusion barrier and interconnect layers in microelectronics research
- Thin-film metallization for semiconductor device prototyping
- Wear-resistant and hard protective coatings
- X-ray and optical coating studies on mirrors and multilayer stacks
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