Tungsten (W) sputtering targets are solid, high-density metal plates used in physical vapor deposition (PVD) to produce thin films. Tungsten is a refractory transition metal valued for its high melting point, hardness, and stability at elevated temperatures. Sputtering targets of this material belong to the refractory metal target group and serve as the source material for depositing tungsten or tungsten-based coatings onto substrates.
- Quantity: 1 piece
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- Diffusion barrier and interconnect layers in microelectronics and semiconductor device research
- Thin-film electrodes and conductive layers for electronic and optoelectronic devices
- Hard and wear-resistant coatings for tooling and mechanical components
- Optical and X-ray related coating studies in laboratory and industrial settings
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