This Nanografi vanadium oxide (V2O5) sputtering target is a 99.9% purity disc measuring 1'' in size and 0.125'' in thickness, supplied as a single piece. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes and gives repeatable results. A process developed at small research and development scale can be extended to production batches covering medium to large substrate areas. Depending on process settings, chemical reactions may take place on the target surface, in flight or on the substrate itself.
Because sputter deposition involves many adjustable parameters, it is a complex technique, but this complexity gives experienced users considerable control over film growth and microstructure.
- Deposition of vanadium oxide thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Materials analysis by sputtering, such as secondary ion mass spectrometry (SIMS) for determining composition and detecting trace impurities.
- Scaling sputtering processes from research and development work to medium and large area production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01VA20
- Material: Vanadium Oxide (V2O5)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01VA20
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