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Vanadium Oxide (V2O5) Sputtering Targets

Vanadium Oxide (V2O5) Sputtering Targets
Regular price Rp 14.317.000,00
Regular price Sale price Rp 14.317.000,00
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Vanadium oxide (V2O5) sputtering targets are solid, oxide-based source materials used in physical vapor deposition (PVD) to produce thin films. V2O5 belongs to the transition metal oxide group, known for its multiple oxidation states and layered structure. During sputtering, the target is bombarded with energetic ions so that material is transferred onto a substrate, forming uniform coatings for research and development.

  • Quantity: 1 piece

For technical specifications, certificates of analysis (CoA), or a quotation, please contact AMI Scientific.

  • Deposition of thin films for electrochromic and smart window research
  • Cathode layer development for lithium-ion and other battery research
  • Fabrication of thin-film gas sensing structures
  • Catalysis and surface science studies using oxide thin films

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