This vanadium oxide (V2O5) sputtering target from Nanografi has a purity of 99.9%, a size of 2'' and a thickness of 0.250''. It is supplied as a single piece and serves as the source material for depositing thin films by sputtering.
In sputter deposition, material is eroded from the target and deposited onto a substrate such as a silicon wafer. The method works with many substrate shapes and sizes, gives repeatable results, and can move from small research and development work to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. Although these many variables make sputtering a complex process, they give experienced users fine control over film growth and microstructure.
- Deposition of thin films onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not critical.
- Material analysis by etching, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Research on space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01VA23
- Material: Vanadium Oxide (V2O5)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01VA23
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