This vanadium oxide (V2O5) sputtering target from Nanografi has a purity of 99.9%, a size of 3'' and a thickness of 0.250''. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established way to coat substrates of many shapes and sizes with thin films. The process is repeatable, works for small research and development projects, and can be scaled to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes the technique complex, but it gives experienced users close control over film growth and microstructure.
- Deposition of vanadium oxide thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Materials analysis by etching away target material, as in secondary ion mass spectrometry (SIMS).
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01VA25
- Material: Vanadium Oxide (V2O5)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01VA25
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