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Vanadium Oxide (V2O5) Sputtering Targets

Vanadium Oxide (V2O5) Sputtering Targets
Regular price Rp 22.213.000,00
Regular price Sale price Rp 22.213.000,00
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Vanadium Oxide (V2O5) Sputting Targets are solid, ceramic-based plates made from vanadium pentoxide, an inorganic transition metal oxide. They are designed for physical vapor deposition (PVD) processes such as sputtering, where material is removed from the target surface and deposited as a thin film onto a substrate. Vanadium oxide thin films are widely studied for their redox and electronic properties, making these targets a common choice for materials research and thin-film development.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.

  • Thin-film deposition research for smart window and thermochromic coatings
  • Development of cathode and electrode layers for energy storage studies
  • Fabrication of gas sensor and electronic device test structures
  • Academic and industrial R&D on oxide thin films and PVD process optimization

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