This Nanografi vanadium oxide (V2O5) sputtering target is a 99.9% purity source material for depositing thin films by sputtering. It measures 4'' in size with a thickness of 0.250'' and is supplied as a single piece.
Sputter deposition works by eroding material from the target and transferring it onto a substrate such as a silicon wafer. The technique handles a broad range of materials and substrate geometries, gives repeatable results, and scales from small R&D work up to production batches covering medium to large substrate areas.
Depending on the process settings, chemical reactions may take place at the target surface, in flight, or on the substrate. Although the large number of process parameters makes sputtering complex, it also gives experienced users fine control over film growth and microstructure.
- Deposition of vanadium oxide thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not a concern.
- Materials analysis such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and trace impurities.
- Scale-up from research and development to production batches on medium to large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01VA27
- Material: Vanadium Oxide (V2O5)
- Size: 4''
- Thickness: 0.250''
—
—