This vanadium oxide (V2O5) sputtering target from Nanografi has a purity of 99.9%, a size of 6'' and a thickness of 0.250''. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established method for coating many types of materials onto substrates of varied shapes and sizes. The process is repeatable and scales from small research and development work to production batches covering medium to large substrate areas.
Depending on the process settings, chemical reactions can take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputtering complex, but it gives experienced users close control over film growth and microstructure.
- Deposition of vanadium oxide thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by etching, for example in secondary ion mass spectrometry (SIMS), where sputtered atoms are identified and quantified to determine composition and trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01VA28
- Material: Vanadium Oxide (V2O5)
- Size: 6''
- Thickness: 0.250''
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