Vanadium (V) sputtering targets are solid, dense plates of elemental vanadium, a transition metal from the d-block of the periodic table. They serve as source material for physical vapor deposition (PVD), where atoms are ejected from the target surface and deposited onto a substrate to form thin films. Sputtering is widely used in research laboratories and industry to produce uniform films with controlled thickness and composition.
- Quantity: 1 piece
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- Deposition of vanadium-based thin films for optical and coating research
- Fabrication of vanadium oxide layers for thermochromic and electrochromic device studies
- Metallization and adhesion layers in microelectronics and sensor prototyping
- Materials research on hard coatings and alloy thin films
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