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Zinc Oxide (ZnO) Sputtering Targets, indium

Zinc Oxide (ZnO) Sputtering Targets, indium
Regular price Rp 31.889.000,00
Regular price Sale price Rp 31.889.000,00
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Zinc oxide (ZnO) sputtering targets are solid source materials used in physical vapor deposition (PVD) to produce thin films. Zinc oxide is an inorganic metal oxide and an n-type semiconductor with a wide band gap, widely studied for optoelectronic and electronic thin-film applications. This product is listed with indium in its title, indicating an indium-containing ZnO target composition.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of transparent conductive oxide films for display and solar cell research
  • Fabrication of thin-film transistor channel layers in electronics research
  • Development of gas sensing and optoelectronic thin-film layers

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