This zinc oxide (ZnO) sputtering target with indium has a purity of 99.9%. It measures 3'' in size and 0.125'' in thickness, and it serves as the source material for depositing thin films by sputtering.
In sputter deposition, material is eroded from the target and lands on a substrate such as a silicon wafer. Films can be grown on substrates of many shapes and sizes. The process gives repeatable results and scales from small research and development work up to production batches covering medium to large substrate areas.
Depending on the process settings, chemical reactions can take place at the target surface, in flight, or on the substrate. Sputter deposition involves many parameters, which makes it complex. Those same parameters give experienced users close control over film growth and microstructure.
- Deposition of thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Materials analysis by etching away target material, for example in secondary ion mass spectroscopy (SIMS), to determine composition and detect trace impurities.
- Research on space weathering, the sputtering process that alters airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01ZN60
- Material: Zinc Oxide (ZnO), indium
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01ZN60
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