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Zinc Oxide (ZnO) Sputtering Targets, indium

Zinc Oxide (ZnO) Sputtering Targets, indium
Regular price Rp 40.017.000,00
Regular price Sale price Rp 40.017.000,00
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Zinc oxide (ZnO) sputtering targets are solid source plates used in physical vapor deposition (PVD) sputtering to form thin films on substrates. This item is listed with indium, so it belongs to the indium-containing zinc oxide target group. Confirm the exact composition in the product datasheet before use.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quote.

  • Transparent conductive oxide layers for displays and touch panels
  • Oxide thin-film transistor and semiconductor device research
  • Thin-film solar cell and optoelectronic layer development
  • Gas sensing and functional coating studies

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