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Zinc Oxide (ZnO) Sputtering Targets

Zinc Oxide (ZnO) Sputtering Targets
Regular price Rp 16.678.000,00
Regular price Sale price Rp 16.678.000,00
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Zinc oxide (ZnO) is an inorganic metal oxide and n-type semiconductor with a wide bandgap, widely studied for functional thin films. A sputtering target is a solid, dense source material used in physical vapor deposition (PVD), where atoms are ejected from the target and deposited onto a substrate to form a uniform thin film.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Transparent conductive oxide layers for display and solar cell research
  • Channel layers in thin-film transistor development
  • Gas sensing and optoelectronic thin-film studies
  • Piezoelectric and surface coating research

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