Zinc oxide (ZnO) sputtering targets are dense ceramic sources of zinc oxide, an inorganic metal oxide semiconductor belonging to the II-VI compound family. They are used in physical vapor deposition (sputtering) to deposit uniform ZnO thin films onto substrates for research and development in electronics and materials science.
- Quantity: 1 piece
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- Deposition of transparent conductive oxide films for optoelectronic device research
- Fabrication of thin-film transistors and semiconductor layer studies
- Buffer and electrode layer development for photovoltaic and solar cell research
- Thin-film gas sensor and piezoelectric coating research
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