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Zinc Oxide (ZnO) Sputtering Targets

Zinc Oxide (ZnO) Sputtering Targets
Regular price Rp 20.278.000,00
Regular price Sale price Rp 20.278.000,00
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Zinc Oxide (ZnO) sputtering targets are solid ceramic source materials used in physical vapor deposition to produce thin films. ZnO is an inorganic metal oxide and a wide-bandgap semiconductor, and it belongs to the oxide ceramics and functional thin-film materials group. Sputtering targets of this type are commonly used in research laboratories and pilot-scale production to deposit uniform oxide coatings on various substrates.

  • Quantity: 1 piece

For technical specifications, CoA, or a quotation, please contact AMI Scientific.

  • Transparent conductive oxide films for optoelectronic devices
  • Thin-film transistors and semiconductor device research
  • Piezoelectric and sensor coating development
  • Functional oxide layers for solar cell and display research

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