This zinc oxide (ZnO) sputtering target from Nanografi is a 3'' target, 0.125'' thick, with a purity of 99.999%. It serves as the source material in sputter deposition systems, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes, and the process is repeatable. It works for small research and development projects and can be scaled to production batches covering medium to large substrate areas. Depending on the process settings, chemical reactions may take place at the target surface, in flight or at the substrate.
Because sputter deposition involves many adjustable parameters, experienced users gain considerable control over film growth and microstructure. The product is supplied as a single piece.
- Deposition of zinc oxide thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Materials analysis methods such as secondary ion mass spectrometry (SIMS), where a sample is sputtered at a constant rate to determine composition and trace impurities.
- Research and development work that may later scale up to production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01ZN40
- Material: Zinc Oxide (ZnO)
- Size: 3''
- Thickness: 0.125''
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