Skip to product information
1 of 1

Nanografi

Zinc Oxide (ZnO) Sputtering Targets

Zinc Oxide (ZnO) Sputtering Targets
Regular price Rp 22.445.000,00
Regular price Sale price Rp 22.445.000,00
Sale Sold out
Shipping calculated at checkout.
Quantity
Quantity
Pembayaran hanya melalui request quotation dan dilakukan setelah tim kami menghubungi Anda. Mohon cantumkan nomor WhatsApp aktif untuk konfirmasi pesanan & pembuatan invoice. Estimasi pengiriman 1-2 bulan setelah pembayaran. Jika belum ada respons, hubungi +62 823-2282-4346.

View full details

Zinc oxide (ZnO) sputtering targets are oxide source materials used in physical vapor deposition (PVD) to form thin films on substrates. ZnO belongs to the group of inorganic metal oxide semiconductors, known for its optical transparency, electronic behavior, and piezoelectric properties. These targets are intended to be mounted in sputtering systems for controlled film deposition in research and development.

  • 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Transparent conductive oxide layers for displays and thin-film solar cells
  • Thin-film transistor research
  • Gas and UV sensor development
  • Piezoelectric thin films for sensors and actuators

Brand —
CAS number —
Molecular formula —
Purity —
Category —
Pack sizes —
Physical form —
Storage —

—

—