Zinc oxide (ZnO) sputtering targets are solid ceramic source materials used in physical vapor deposition (PVD) to form zinc oxide thin films. ZnO belongs to the group of inorganic metal oxides and is a wide-bandgap n-type semiconductor widely studied in electronics and optoelectronics. Sputtering targets provide a stable, uniform source for depositing consistent films onto substrates in research environments.
- Quantity: 1 piece
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- Transparent conductive oxide films for optoelectronic device research
- Thin-film transistor channel layers in electronics development
- Piezoelectric and acoustic thin films for sensor studies
- Gas sensing layers for chemical sensor prototypes
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