This item is a zinc oxide (ZnO) sputtering target supplied with alumina and indium as listed in the product title. ZnO is an inorganic n-type semiconductor oxide with a wide bandgap, and in sputtering target form it serves as a solid source material for physical vapor deposition (PVD) of thin films. Alumina and indium additions are commonly associated with doped ZnO compositions used for transparent conductive layers.
- Quantity: 1 piece
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- Transparent conductive oxide films for displays and touch panels
- Electrodes in thin-film solar cells and organic photovoltaic devices
- Thin-film transistors and oxide semiconductor research
- Gas sensor and UV-sensitive optoelectronic layer development
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