This item is a sputtering target based on zinc oxide (ZnO) combined with alumina (Al2O3). Zinc oxide is an n-type metal oxide semiconductor. Alumina-doped zinc oxide is commonly classed as a transparent conductive oxide (TCO) material. The title also lists indium, which may indicate a mixed-oxide or co-doped composition, so please confirm the exact formulation with AMI Scientific before use. Sputtering targets are solid source materials used in physical vapor deposition (PVD) to form thin films.
- Quantity: 1 piece
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- Transparent conductive electrodes for displays and touch panels
- Thin-film layers for solar cells and photovoltaic research
- Thin-film transistor and optoelectronic device development
- Gas sensor and functional coating research
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