This item is a sputtering target, a solid source material used in physical vapor deposition (PVD) to deposit thin films onto substrates. Based on the product title, it combines zinc oxide (ZnO), a wide-bandgap metal oxide semiconductor, with alumina (Al2O3), a ceramic oxide, and indium is also listed in the name. The exact composition and form should be confirmed with AMI Scientific before use.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Deposition of transparent conductive oxide thin films
- Thin-film optoelectronic and semiconductor device research
- Photovoltaic layer development in laboratory settings
- Gas sensor and functional coating studies
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