This product is a sputtering target made from zinc oxide (ZnO) combined with alumina and indium, as described in the product title. Zinc oxide is an n-type wide bandgap oxide semiconductor. Sputtering targets are dense ceramic source materials used in physical vapor deposition (PVD) to form uniform thin films on substrates. This target belongs to the oxide ceramic group, which is widely used in thin-film research.
- Quantity: 1 piece
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- Deposition of transparent conductive oxide thin films
- Thin-film transistor and oxide electronics research
- Optoelectronic device development
- Gas sensing film fabrication
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