Zinc oxide (ZnO) sputtering targets with alumina and indium are ceramic oxide source materials used in physical vapor deposition (PVD) processes. ZnO is a wide-bandgap oxide semiconductor, and alumina and indium additions are commonly explored for modifying the electrical and optical behavior of doped zinc oxide thin films. This Nanografi product is supplied as a sputtering target for thin film deposition in research settings.
- Quantity: 1 piece
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- Research on transparent conductive oxide thin films
- Thin-film transistor and display device development
- Photovoltaic buffer or electrode layer studies
- Prototyping of optoelectronic and gas sensing devices
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