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Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium

Zinc Oxide (ZnO) with Alumina Sputtering Targets, indium
Regular price Rp 23.645.000,00
Regular price Sale price Rp 23.645.000,00
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This product is a sputtering target based on zinc oxide (ZnO) combined with alumina (Al2O3), as indicated by its name. Zinc oxide-based targets belong to the family of ceramic targets used in physical vapor deposition to form thin films. The product name also lists indium, so the exact composition should be confirmed against the product specification.

  • Quantity: 1 piece

For technical specifications, certificate of analysis, or a quotation, please contact AMI Scientific.

  • Deposition of transparent conductive thin films for display and optoelectronic research
  • Development of electrode layers for thin-film solar cells
  • Sputter deposition studies of doped zinc oxide films
  • Surface and coating research in materials science laboratories

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