This product is a zinc oxide (ZnO) sputtering target, a ceramic source material used in physical vapor deposition (PVD) to form thin films on substrates. ZnO belongs to the group of wide-bandgap metal oxide semiconductors. Based on the product title, the target includes alumina and indium additions, so it is a doped zinc oxide ceramic target. The exact composition should be confirmed with the product documentation.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, Certificate of Analysis, or a quotation.
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- Semiconductor layers for thin-film transistor studies
- Functional oxide coatings for gas sensor and optoelectronic research
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