This zinc oxide (ZnO) with alumina sputtering target is an oxide ceramic prepared as a source material for physical vapor deposition (PVD), where sputtering transfers its material onto a substrate to form thin films. It belongs to the category of oxide ceramic sputtering targets, combining zinc oxide, a wide-bandgap II-VI semiconductor oxide, with alumina (Al2O3) as an additive phase commonly studied for tuning film properties.
- Quantity: 1 piece
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- Deposition of transparent conductive oxide thin films for display and photovoltaic research
- Fabrication of thin-film transistor and gas sensor layers in academic and industrial R&D
- Optical and protective coating development on glass and polymer substrates
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