This zinc sulfide (ZnS) sputtering target is a 99.99% pure source material for depositing ZnS thin films by sputtering. Each target measures 1'' in size with a thickness of 0.250'' and is supplied as a single piece.
In sputter deposition, material is eroded from the target and deposited onto a substrate such as a silicon wafer. The technique can coat substrates of many shapes and sizes, gives repeatable results, and scales from small research and development work to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. The many adjustable parameters make sputtering a complex process, but they give experienced users considerable control over film growth and microstructure.
- Thin film deposition of zinc sulfide onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Materials analysis by etching away target material, as in secondary ion mass spectrometry (SIMS).
- Research and development projects that may later scale to larger production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST02ZN01
- Material: Zinc Sulfide (ZnS)
- Size: 1''
- Thickness: 0.250''
- Product code: NG0ST02ZN01
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