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Zinc (Zn) Sputtering Targets, indium

Zinc (Zn) Sputtering Targets, indium
Regular price Rp 15.130.000,00
Regular price Sale price Rp 15.130.000,00
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Zinc (Zn) sputtering targets are solid metallic source materials used in physical vapor deposition (PVD). During sputtering, energetic ions bombard the target surface and eject zinc atoms, which then condense onto a substrate to form a thin film. As an elemental metal target, zinc is commonly used in reactive sputtering, where a reactive gas such as oxygen forms zinc-based compound films.

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For technical specifications, CoA, or quotation, please contact AMI Scientific.

  • Deposition of zinc oxide (ZnO) thin films by reactive sputtering
  • Research on transparent conductive oxides and optoelectronic devices
  • Functional and protective coatings on glass or metal substrates
  • Thin-film sensor and semiconductor device prototyping

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