Zinc (Zn) sputtering targets are solid metal source materials used in physical vapor deposition (PVD), particularly magnetron sputtering, to deposit thin films of zinc or zinc-based compounds onto substrates. As a nanomaterial-category product, the target serves as the controlled material source in vacuum deposition processes. The product title also references indium, so the exact composition should be confirmed before use.
- 1 piece
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- Deposition of zinc-based thin films for semiconductor and optoelectronic device research
- Development of transparent conductive oxide layers using reactive sputtering
- Fabrication of buffer and interlayer films for photovoltaic research
- Protective and functional coating studies on metal and glass substrates
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